D in LaAlGe [39]. An additional characteristic feature of WTe2 is the intense good transverse magnetoresistance MR , which can attain values as high as 105 for magnetic fields 9 T applied parallel to the c-axis of bulk or thin flakes of WTe2 inside the Fermi liquid phase at T 100 mK [402]. Also, evidence of topologically protected conducting edge states [43] and flat-band BVT948 Protocol superconductivity in close proximity to Pd [44] and Nb [45] was shown in bulk and couple of layers WTe2 flakes, although quantum spin Hall states are discovered in mechanically exfoliated monolayer WTe2 [46]. Most of the reported literature on Td -WTe2 issues bulk crystals or mechanically exfoliated flakes. Although the bulk crystals are chemically steady [40], the ultrathin exfoliated flakes of Td -WTe2 are reported to be prone to oxidation and call for inert ambient for fabrication and sample processing [43]. In unique, it can be not evident whether the crystal exfoliates along a preferred direction corresponding towards the a- or QX-314 site b-axes [14]. Also, aside from the observed extreme positive MR , weak-antilocalization (WAL) and negative longitudinal magnetoresistance MR with chiral anomaly are reported in exfoliated flakes of Td -WTe2 [14,34]. Right here, mechanically exfoliated 45 nm thin flakes of Td -WTe2 are studied by means of atomic force microscopy (AFM), Raman spectroscopy, optical reflectivity and low-T/high- H magnetotransport measurements. Beside confirming the chemical stability in the program in ambient conditions, a Fermi liquid behavior is located, with substantial good MR as much as 1200 , typical carrier mobility v 5000 cm2 V-1 s-1 and chiral anomaly persisting as much as T 120 K. two. Supplies and Techniques The WTe2 flakes are fabricated by way of mechanical exfoliation from a bulk (mother) crystal obtained commercially from hqgraphene (http://www.hqgraphene (accessed on 1 September 2019). Micromechanical cleavage is repeated applying fresh Nitto tapes until 45 nm thin flakes are obtained. Upon exfoliation, the flakes are transferred onto Gelpack Grade 4 viscoelastic polydimethylsiloxane (PDMS) stamps having a rigid metallic assistance. The mechanical exfoliation approach outcomes in an ensemble of flakes with diverse sizes, geometries and thicknesses, distributed more than the PDMS stamp. The exfoliated flakes on the PDMS are then analysed for thickness and number of layers working with a high resolution Keyence VHX-7000 optical microscope (Keyence, Osaka, Japan) operated in transmission mode. Flakes of uniform thickness are then transferred onto prepatterned SiO2 /p -Si substrates with markers and metal get in touch with pads. The flakes transferred onto the pristine substratesNanomaterials 2021, 11,coated with S1805 constructive photoresist followed by soft baking at 90 C. A S s Mask aligner photolithography method is employed to expose the S1805 coated substrates to an ultraviolet mercury lamp by means of a window mask. The substrates are created applying a standard MS-519 photolithography developer and subsequently transferred into a of 18 sputtering chamber for the deposition of ten nm thick Pt contacts. The metallic contact3pads in van der Pauw 4-probe geometry are then obtained by rinsing away the photoresist with warm acetone for 15 seconds in an ultrasonic bath. The exfoliated WTe2 flakes are transferred onto both pristine and prepatterned subare used for AFM, Raman spectroscopy and optical measurements, even though the samples strates using an indigeneously developed viscoelastic dry transfer program [47]. Gold wires fabricated on the.